Invention Grant
- Patent Title: Extended depth-of-field lenses and methods for their design, optimization and manufacturing
- Patent Title (中): 扩展的景深透镜及其设计,优化和制造的方法
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Application No.: US12167741Application Date: 2008-07-03
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Publication No.: US07898746B2Publication Date: 2011-03-01
- Inventor: Nicholas George , Xi Chen
- Applicant: Nicholas George , Xi Chen
- Applicant Address: KY Grand Cayman
- Assignee: Aptina Imaging Corporation
- Current Assignee: Aptina Imaging Corporation
- Current Assignee Address: KY Grand Cayman
- Agency: Kramer Levin Naftalis & Frankel LLP
- Main IPC: G02B13/18
- IPC: G02B13/18 ; G02B3/02 ; G02B3/10

Abstract:
For rotationally symmetric aspheric lenses, one can establish lens design and layout based upon the phase delay function exp[−iφ(ρ)]. An embodiment of the invention is a method for calculating a corresponding variation in focal length denoted by f(ρ). According to an aspect, one can also assert a shape for the focal length f(ρ) and thereafter calculate a phase delay function in order to synthesize a novel lens. New EDoF lens designs are obtained by selection of an inner and outer focal length connected by a simple curve that can be approximate by a polynomial. From the selected f(ρ), one can synthesize a finished EDoF lens design and fabricate the lens. Another aspect of this invention is directed to a method to tailor prior-art EDoF lenses so that their performance over some range is improved.
Public/Granted literature
- US20100002310A1 Extended Depth-of-Field Lenses and Methods For Their Design, Optimization and Manufacturing Public/Granted day:2010-01-07
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