Invention Grant
- Patent Title: Laser lithography system with improved bandwidth control
- Patent Title (中): 激光光刻系统具有改进的带宽控制
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Application No.: US12082301Application Date: 2008-04-09
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Publication No.: US07899095B2Publication Date: 2011-03-01
- Inventor: William N. Partlo
- Applicant: William N. Partlo
- Applicant Address: US CA San Diego
- Assignee: Cymer, Inc.
- Current Assignee: Cymer, Inc.
- Current Assignee Address: US CA San Diego
- Agency: DiBerardino Law LLC
- Main IPC: H01S3/097
- IPC: H01S3/097 ; H01S3/098 ; H01S3/1055 ; H01S3/123 ; H01S3/125

Abstract:
A method and apparatus may comprise a seed laser, along with an amplifier laser amplifying the output of the seed laser. A bandwidth metrology module may provide a bandwidth measurement and a bandwidth error signal may be provided using a bandwidth set point. A differential timing system responsive to the error signal can selectively adjust a differential firing time between the seed laser and amplifier laser. A beam dimension and center wavelength control system may adjust a beam dimension, within the cavity of the seed laser, to select bandwidth, and may adjust center wavelength at the same time, using a plurality of beam expansion prisms and at least one other prism or other optical element in the cavity to select center wavelength.
Public/Granted literature
- US20080253413A1 Laser lithography system with improved bandwidth control Public/Granted day:2008-10-16
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