Invention Grant
- Patent Title: EL semiconductor device
- Patent Title (中): EL半导体器件
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Application No.: US12038062Application Date: 2008-02-27
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Publication No.: US07899104B2Publication Date: 2011-03-01
- Inventor: Katsumi Kishino , Ichiro Nomura , Tsunenori Asatsuma , Kunihiko Tasai , Koshi Tamamura , Hiroshi Nakajima , Hitoshi Nakamura , Sumiko Fujisaki , Takeshi Kikawa
- Applicant: Katsumi Kishino , Ichiro Nomura , Tsunenori Asatsuma , Kunihiko Tasai , Koshi Tamamura , Hiroshi Nakajima , Hitoshi Nakamura , Sumiko Fujisaki , Takeshi Kikawa
- Applicant Address: JP Tokyo JP Tokyo JP Tokyo
- Assignee: Hitachi, Ltd.,Sophia School Corporation,Sony Corporation
- Current Assignee: Hitachi, Ltd.,Sophia School Corporation,Sony Corporation
- Current Assignee Address: JP Tokyo JP Tokyo JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP.
- Priority: JP2007-225724 20070831
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
An n-type cladding layer structure which has good luminescence properties without the use of substances corresponding to RoHS Directive and a high Cl-doping efficiency, i.e. which facilitates the manufacture of a semiconductor optical element and device with low crystal defects and high reliability, and an active layer and a p-type cladding layer therefor are provided. The n-type layer being lattice matched to an InP substrate and containing Group II-VI compound as a main ingredient is a Group II-VI compound semiconductor, in which the Group II elements consist of Mg, Zn, and Be and the Group VI elements consist of Se and Te. The n-type layer of the present invention is characterized by a large energy gap, high energy of the bottom of a conduction band that is effective for suppressing the Type II luminescence, high carrier concentration, and low crystal defects attributed to a good quality crystallinity.
Public/Granted literature
- US20090059985A1 EL SEMICONDUCTOR DEVICE Public/Granted day:2009-03-05
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