Invention Grant
US07900342B2 Methods of fabricating magnetoresistance sensors pinned by an etch induced magnetic anisotropy
有权
制造由蚀刻诱导的磁各向异性固定的磁阻传感器的方法
- Patent Title: Methods of fabricating magnetoresistance sensors pinned by an etch induced magnetic anisotropy
- Patent Title (中): 制造由蚀刻诱导的磁各向异性固定的磁阻传感器的方法
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Application No.: US11678427Application Date: 2007-02-23
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Publication No.: US07900342B2Publication Date: 2011-03-08
- Inventor: James M. Freitag , Mustafa M. Pinarbasi
- Applicant: James M. Freitag , Mustafa M. Pinarbasi
- Applicant Address: NL Amsterdam
- Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
- Current Assignee: Hitachi Global Storage Technologies Netherlands, B.V.
- Current Assignee Address: NL Amsterdam
- Agency: Duft Bornsen & Fishman, LLP
- Main IPC: G11B5/127
- IPC: G11B5/127 ; H04R31/00

Abstract:
Magnetoresistance sensors with magnetic pinned layers that are pinned by anisotropic etch induced magnetic anisotropies and methods for fabricating the magnetoresistance sensors are provided. The method comprises forming a seed layer structure. The seed layer is etched to form an anisotropic etch along a top surface of the seed layer. A magnetic pinned layer is formed on the top surface of the seed layer structure. The anisotropic etch on the top surface of the seed layer structure induces a magnetic anisotropy in the magnetic pinned layer, which pins the magnetization of the magnetic pinned layer structure.
Public/Granted literature
- US20080204945A1 MAGNETORESISTANCE SENSORS PINNED BY AN ETCH INDUCED MAGNETIC ANISOTROPY Public/Granted day:2008-08-28
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