Invention Grant
- Patent Title: Method and device for calibration sensors
- Patent Title (中): 校准传感器的方法和装置
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Application No.: US11899659Application Date: 2007-09-07
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Publication No.: US07900496B2Publication Date: 2011-03-08
- Inventor: Felix Mayer , Mathias Deschler , Urs Rothacher , René Hummel
- Applicant: Felix Mayer , Mathias Deschler , Urs Rothacher , René Hummel
- Applicant Address: CH Stafa
- Assignee: Sensirion AG
- Current Assignee: Sensirion AG
- Current Assignee Address: CH Stafa
- Agency: Cooper & Dunham LLP
- Agent Richard F. Jaworski
- Priority: EP04019445 20040817
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A method and device are disclosed for calibrating sensors, which sensors are arranged on semiconductor chips and are e.g. to be used for detecting a substance in a fluid. The sensors are calibrated while they are still assembled on a semiconductor wafer by exposing the wafer to a calibration fluid containing a known amount of the substance to be measured. Hence, rather than first cutting the wafer, the sensors are calibrated at an early stage. For this purpose, they are placed on a chuck below a lid. The calibration fluid with known parameters is introduced between the wafer and the lid. This allows to test and calibrate a large number of sensors quickly.
Public/Granted literature
- US20080006076A1 Method and device for calibration sensors Public/Granted day:2008-01-10
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