Invention Grant
- Patent Title: Acceleration sensor and fabrication method thereof
- Patent Title (中): 加速度传感器及其制造方法
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Application No.: US11946507Application Date: 2007-11-28
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Publication No.: US07900515B2Publication Date: 2011-03-08
- Inventor: Yasuo Yamaguchi , Makio Horikawa , Mika Okumura , Kimitoshi Sato , Takeshi Murakami
- Applicant: Yasuo Yamaguchi , Makio Horikawa , Mika Okumura , Kimitoshi Sato , Takeshi Murakami
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-149504 20070605
- Main IPC: G01P15/125
- IPC: G01P15/125

Abstract:
First and second semiconductor layers are attached to each other with an insulation layer sandwiched therebetween. An acceleration sensor device is formed in the first semiconductor layer. A control device for controlling the acceleration sensor device is formed on the second semiconductor layer. Through holes are formed in the second semiconductor layer, and an insulation layer is formed to cover the wall surfaces of the through holes. Through interconnections are formed within the through holes for electrically connecting the acceleration sensor device and the control device to each other. Accordingly, it is possible to obtain an acceleration sensor having excellent detection accuracy while having a reduced size, and a fabrication method thereof.
Public/Granted literature
- US20080302184A1 ACCELERATION SENSOR AND FABRICATION METHOD THEREOF Public/Granted day:2008-12-11
Information query
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