A cleaning apparatus includes a cleaning tank (2) which stores a process liquid used for cleaning a target object (W), a target object holding mechanism (4) which holds the target object (W) in the cleaning tank (2), and a process liquid supply mechanism (3) which supplies the process liquid to the cleaning tank (2). The target object (W) is immersed in the process liquid in the cleaning tank (2), and is cleaned while letting the process liquid overflow from the cleaning tank (2), thereby cleaning the target object (W). The cleaning apparatus further includes a cover (10) which covers a liquid surface in the cleaning tank (2), a support member (15a, 15b) which supports the cover (10), and a follow-up mechanism (14a, 14b) which moves the cover (10) such that the cover (10) follows the liquid surface while the cover (10) is supported by the support member (15a, 15b).