Invention Grant
- Patent Title: Method for lateral implantation of spinous process spacer
- Patent Title (中): 棘突侧植入方法
-
Application No.: US10790651Application Date: 2004-03-01
-
Publication No.: US07901432B2Publication Date: 2011-03-08
- Inventor: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant Address: CH Neuchatel
- Assignee: Kyphon SARL
- Current Assignee: Kyphon SARL
- Current Assignee Address: CH Neuchatel
- Agency: Coats and Bennett, P.L.L.C.
- Main IPC: A61F2/44
- IPC: A61F2/44

Abstract:
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant in an embodiment comprises a device positioned between spinous processes which provides a spinal extension stop and a spinal column flexion non-inhibitor thereby allowing freedom of spinal flexion. In an embodiment a distraction wedge can be used to distract the spinous processes. Methods for the preparation and implantation of a spine distraction device involve in an embodiment of the invention accessing the spinous processes, distracting and implanting the spinal distraction device between the spinous processes using a lateral insertion approach.
Public/Granted literature
- US20040220568A1 Method for lateral implantation of spinous process spacer Public/Granted day:2004-11-04
Information query
IPC分类: