Invention Grant
- Patent Title: Sputtering target with grooves and intersecting channels
- Patent Title (中): 溅射靶与凹槽和相交通道
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Application No.: US11867914Application Date: 2007-10-05
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Publication No.: US07901552B2Publication Date: 2011-03-08
- Inventor: Cristopher M. Pavloff
- Applicant: Cristopher M. Pavloff
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agent Ashok K. Janah
- Main IPC: C23C14/35
- IPC: C23C14/35
Abstract:
A sputtering chamber has a sputtering target comprising a backing plate and a sputtering plate. The backing plate comprises a backside surface having a plurality of concentric circular grooves and a plurality of arcuate channels which intersect the circular grooves. The sputtering target can be positioned abutting a heat exchanger housing which holds heat transfer fluid and a plurality of rotatable magnets.
Public/Granted literature
- US20090090620A1 SPUTTERING TARGET WITH GROOVES AND INTERSECTING CHANNELS Public/Granted day:2009-04-09
Information query
IPC分类:
