Invention Grant
- Patent Title: Method of producing porous silica-based particles
- Patent Title (中): 生产多孔二氧化硅基颗粒的方法
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Application No.: US11793707Application Date: 2005-12-15
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Publication No.: US07901652B2Publication Date: 2011-03-08
- Inventor: Kazuaki Inoue , Kazuhiro Nakayama , Akira Nakashima
- Applicant: Kazuaki Inoue , Kazuhiro Nakayama , Akira Nakashima
- Applicant Address: JP Kawasaki-shi, Kanagawa
- Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee: JGC Catalysts and Chemicals Ltd.
- Current Assignee Address: JP Kawasaki-shi, Kanagawa
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2004-368582 20041221
- International Application: PCT/JP2005/023013 WO 20051215
- International Announcement: WO2006/068020 WO 20060629
- Main IPC: C01B33/141
- IPC: C01B33/141 ; C01B33/143

Abstract:
Porous silica-based particles with relatively larger average diameter of 1 micron or more and a low particle density are prepared. The method includes the steps of (a) preparing two-layer separated liquid including an organic silicon compound layer and a water layer, then adding an organic solvent, an alkali, and a surfactant into the water layer while agitating at least the water layer so that the organic silicon compound layer and the water layer are not completely mixed with each other, further hydrolyzing and/or partial hydrolyzing the organic silicon compound in the mixed aqueous solution to prepare silica-based particle precursors, (b) adding sodium aluminate into the mixed aqueous solution containing the silica-based particle precursors and then preparing silica-based particles having pores, cavities or voids inside the particles, and (c) washing and drying the silica-based particles. The particles are useful for various applications such as microcapsules, adsorbents, catalysts, and so on.
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