Invention Grant
US07901797B2 Low-adhesion material, resin molding die, and soil resistant material
有权
低粘附性材料,树脂成型模具和防污材料
- Patent Title: Low-adhesion material, resin molding die, and soil resistant material
- Patent Title (中): 低粘附性材料,树脂成型模具和防污材料
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Application No.: US11988802Application Date: 2006-12-27
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Publication No.: US07901797B2Publication Date: 2011-03-08
- Inventor: Takaki Kuno , Yoshinori Noguchi , Keiji Maeda , Satoshi Kitaoka , Naoki Kawashima
- Applicant: Takaki Kuno , Yoshinori Noguchi , Keiji Maeda , Satoshi Kitaoka , Naoki Kawashima
- Applicant Address: JP Kyoto-shi JP Nagoya-shi
- Assignee: Towa Corporation,Japan Fine Ceramics Center
- Current Assignee: Towa Corporation,Japan Fine Ceramics Center
- Current Assignee Address: JP Kyoto-shi JP Nagoya-shi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-108869 20060411
- International Application: PCT/JP2006/326026 WO 20061227
- International Announcement: WO2007/116571 WO 20071018
- Main IPC: B32B9/00
- IPC: B32B9/00

Abstract:
An upper die has a cavity member constituting an inner bottom surface of a cavity, and a surrounding member. The cavity member is formed of a low adhesion material in accordance with the present invention, and includes a body portion and a surface layer formed on an undersurface of the body portion exposed to a fluid resin. The body portion is formed of a first material of 3YSZ and a second material of ZrN that are mixed at a predetermined ratio. The surface layer is formed of Y2O3 having a low adhesion property with respect to a set resin, and has a thermal expansion coefficient smaller than that of the body portion. By bonding the body portion and the surface layer at a high temperature and then cooling them down, compressive residual stress is caused in the surface layer due to a difference in the thermal expansion coefficients thereof, and the compressive residual stress is present in the surface layer.
Public/Granted literature
- US20090107361A1 Low-Adhesion Material, Resin Molding Die, and Soil Resistant Material Public/Granted day:2009-04-30
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