Invention Grant
- Patent Title: Method for optical proximity correction of a reticle to be manufactured using character projection lithography
- Patent Title (中): 使用字符投影光刻制造的掩模版的光学邻近校正的方法
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Application No.: US12202365Application Date: 2008-09-01
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Publication No.: US07901845B2Publication Date: 2011-03-08
- Inventor: Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
- Applicant: Akira Fujimura , Lance Glasser , Takashi Mitsuhashi , Kazuyuki Hagiwara
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: The Mueller Law Office, P.C.
- Main IPC: G03F9/00
- IPC: G03F9/00
Abstract:
A method for optical proximity correction of a design of a pattern on a surface is disclosed with the method comprising the steps of inputting desired patterns for the substrate and inputting a set of characters some of which are complex characters that may be used for forming the patterns on the surface. A method of creating glyphs is also disclosed.
Public/Granted literature
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