Invention Grant
US07901871B2 Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
有权
含有光酸产生剂单体的组合物，用该组合物涂布的基材，使用该组合物在基材上合成化合物的方法，以及根据该方法制造的微阵列
- Patent Title: Composition containing a photoacid generator monomer, substrate coated with the composition, method for synthesizing a compound on a substrate using the composition, and microarray produced according to the method
- Patent Title (中): 含有光酸产生剂单体的组合物，用该组合物涂布的基材，使用该组合物在基材上合成化合物的方法，以及根据该方法制造的微阵列
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Application No.: US11971440Application Date: 2008-01-09
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Publication No.: US07901871B2Publication Date: 2011-03-08
- Inventor: Sung-ouk Jung , Seung-ju Seo , Jae-chan Park
- Applicant: Sung-ouk Jung , Seung-ju Seo , Jae-chan Park
- Applicant Address: KR
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR
- Agency: Cantor Colburn LLP
- Priority: KR2003-58782 20030825
- Main IPC: G03F7/30
- IPC: G03F7/30 ; C07C309/06
Abstract:
A composition containing a photoacid generator monomer and surfactant, and a method for synthesizing a compound on a substrate using the composition are provided. The method includes bonding a layer of first molecules having an acid labile protecting group to a solid substrate; coating a layer of the photoacid generator monomer composition according to the present invention on the layer of first molecules; exposing the composition layer to light and then heat-treating to remove the acid labile protecting group from the first molecules corresponding to the exposed portion; washing and removing the composition layer from the exposed and unexposed portions; and bonding second molecules to the exposed first molecules.
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