Invention Grant
- Patent Title: Wiring substrate, manufacturing method thereof, and semiconductor device
- Patent Title (中): 配线基板及其制造方法以及半导体装置
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Application No.: US11984004Application Date: 2007-11-13
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Publication No.: US07901986B2Publication Date: 2011-03-08
- Inventor: Tadashi Arai , Toshio Kobayashi
- Applicant: Tadashi Arai , Toshio Kobayashi
- Applicant Address: JP Nagano-shi
- Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee: Shinko Electric Industries Co., Ltd.
- Current Assignee Address: JP Nagano-shi
- Agency: Kratz, Quintos & Hanson, LLP
- Priority: JP2006-351000 20061227
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
In a wiring substrate according to the present invention, a base wiring board is constructed by stacking a plurality of unit wiring boards each having wiring patterns which enable an electrical connection between upper and lower sides, in a state that the plurality of unit wiring boards are connected to each other via a connection terminal, and a silicon interposer is stacked on the base wiring board via a connection terminal, and a resin portion is filled in a gap between the plurality of unit wiring boards as well as a gap between the base wiring board and the silicon interposer, and a resin portion serves as a substrate which integrates the base wiring board and the silicon interposer.
Public/Granted literature
- US20080155820A1 Wiring substrate, manufacturing method thereof, and semiconductor device Public/Granted day:2008-07-03
Information query
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