Invention Grant
- Patent Title: Method of manufacturing non-volatile semiconductor storage device
- Patent Title (中): 制造非易失性半导体存储装置的方法
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Application No.: US12858478Application Date: 2010-08-18
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Publication No.: US07902023B2Publication Date: 2011-03-08
- Inventor: Tatsuo Izumi , Takeshi Kamigaichi
- Applicant: Tatsuo Izumi , Takeshi Kamigaichi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2007-262430 20071005
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
A non-volatile semiconductor storage device includes: a substrate; a control circuit layer provided on the substrate; a support layer provided on the control circuit layer; and a memory cell array layer provided on the support layer. The memory cell array layer includes: a first lamination part having first insulation layers and first conductive layers alternately laminated therein; and a second lamination part provided on either the top or bottom surface of the respective first lamination part and laminated so as to form a second conductive layer between second insulation layers. The control circuit layer includes at least any one of: a row decoder driving word lines provided in the memory cell array layer, and a sense amplifier sensing and amplifying a signal from bit lines provided in the memory cell array layer.
Public/Granted literature
- US20100311210A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2010-12-09
Information query
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