Invention Grant
- Patent Title: Charged particle beam reflector device and electron microscope
- Patent Title (中): 带电粒子束反射器和电子显微镜
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Application No.: US12285673Application Date: 2008-10-10
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Publication No.: US07902504B2Publication Date: 2011-03-08
- Inventor: Hirotami Koike , Shinichi Okada
- Applicant: Hirotami Koike , Shinichi Okada
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha TOPCON
- Current Assignee: Kabushiki Kaisha TOPCON
- Current Assignee Address: JP Tokyo
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2007-266053 20071012
- Main IPC: H01J3/16
- IPC: H01J3/16 ; H01J37/12 ; H01J37/26

Abstract:
A charged particle beam reflector device is configured to include at least two electrostatic mirrors arranged with a predetermined interval on a linear optical axis, each having a through hole through which a charged particle beam radiated from an electron gun along a linear optical axis passes, and having a function of reflecting the charged particle beam or allowing the charged particle beam to pass through the through hole in accordance with an applied voltage, and a controller controlling an applied voltage to the at least two electrostatic mirrors. The controller applies, to each of the electrostatic mirrors, a reflection voltage allowing the electrostatic mirrors to reflect the charged particle beam at a predetermined timing so that the charged particle beam from the electron gun is reflected by the at least two electrostatic mirrors a plurality of times.
Public/Granted literature
- US20090095904A1 Charged particle beam reflector device and electron microscope Public/Granted day:2009-04-16
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