Invention Grant
- Patent Title: 3D two-photon lithographic microfabrication system
- Patent Title (中): 3D双光子平版微细加工系统
-
Application No.: US12431254Application Date: 2009-04-28
-
Publication No.: US07902526B2Publication Date: 2011-03-08
- Inventor: Daekeun Kim , Peter T. C. So
- Applicant: Daekeun Kim , Peter T. C. So
- Applicant Address: US MA Cambridge
- Assignee: Massachusetts Institute of Technology
- Current Assignee: Massachusetts Institute of Technology
- Current Assignee Address: US MA Cambridge
- Agency: Gauthier & Connors LLP
- Main IPC: H04B10/00
- IPC: H04B10/00 ; G02B26/02 ; H01S4/00

Abstract:
An imaging system is provided that includes a optical pulse generator for providing an optical pulse having a spectral bandwidth and includes monochromatic waves having different wavelengths. A dispersive element receives a second optical pulse associated with the optical pulse and disperses the second optical pulse at different angles on the surface of the dispersive element depending on wavelength. One or more focal elements receives the dispersed second optical pulse produced on the dispersive element. The one or more focal element recombine the dispersed second optical pulse at a focal plane on a specimen where the width of the optical pulse is restored at the focal plane.
Public/Granted literature
- US20090278058A1 3D TWO-PHOTON LITHOGRAPHIC MICROFABRICATION SYSTEM Public/Granted day:2009-11-12
Information query