Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
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Application No.: US12274740Application Date: 2008-11-20
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Publication No.: US07902539B2Publication Date: 2011-03-08
- Inventor: Masahiro Moniwa , Fumihiko Nitta , Masamichi Matsuoka , Satoshi Iida
- Applicant: Masahiro Moniwa , Fumihiko Nitta , Masamichi Matsuoka , Satoshi Iida
- Applicant Address: JP Tokyo
- Assignee: Renesas Technology Corp.
- Current Assignee: Renesas Technology Corp.
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-309124 20071129
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
Any of a plurality of contact plugs which reaches a diffusion layer serving as a drain layer of an MOS transistor has an end provided in contact with a lower surface of a thin insulating film provided selectively on an interlayer insulating film. A phase change film constituted by GST to be a chalcogenide compound based phase change material is provided on the thin insulating film, and an upper electrode is provided thereon. Any of the plurality of contact plugs which reaches the diffusion layer serving as a source layer has an end connected directly to an end of a contact plug penetrating an interlayer insulating film.
Public/Granted literature
- US20090140234A1 SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2009-06-04
Information query
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