Invention Grant
- Patent Title: Capillary underfill of stacked wafers
- Patent Title (中): 堆叠晶片的毛细管底部填充物
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Application No.: US12220256Application Date: 2008-07-22
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Publication No.: US07902675B2Publication Date: 2011-03-08
- Inventor: Preston T. Myers
- Applicant: Preston T. Myers
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Blakely, Sokoloff, Taylor & Zafman LLP
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
A plurality of wafers are aligned and stacked on a thermally variable rotary table, the table and stack are rotated, and an underfill material is disposed and cured between wafers in the stack, bonding the wafers. Corresponding wafer portions of the plurality of wafers in the stack may be singulated from the stack, and may comprise semiconductor device packages either individually or when coupled with a substrate.
Public/Granted literature
- US20080284044A1 Capillary underfill of stacked wafers Public/Granted day:2008-11-20
Information query
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