Invention Grant
- Patent Title: Electromagnetic tracking method and apparatus for compensation of metal artifacts using modular arrays of reference sensors
- Patent Title (中): 使用参考传感器模块化阵列补偿金属伪影的电磁跟踪方法和装置
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Application No.: US12095742Application Date: 2006-12-11
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Publication No.: US07902816B2Publication Date: 2011-03-08
- Inventor: Guy Shechter
- Applicant: Guy Shechter
- Applicant Address: NL Eindhoven
- Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee: Koninklijke Philips Electronics N.V.
- Current Assignee Address: NL Eindhoven
- International Application: PCT/IB2006/054748 WO 20061211
- International Announcement: WO2007/069186 WO 20070621
- Main IPC: G01B7/00
- IPC: G01B7/00 ; G01B7/14

Abstract:
An electromagnetic tracking method includes generating an electromagnetic field (14) in a region of interest (16). The electromagnetic field is subject to distortion in response to a presence of metal artifacts proximate the electromagnetic field. An array of reference sensors (30,50,102,104,110) having a predefined known configuration are disposed proximate the region of interest. A first set of locations of the array of reference sensors is determined with respect to the electromagnetic field generator (12) in response to an excitation of one or more of the reference sensors via the electromagnetic field. A second mechanism (28), other than the electromagnetic field, determines a first portion of a second set of locations of at least one or more sensors of the array of reference sensors with respect to the second mechanism, the second mechanism being in a known spatial relationship with the electromagnetic field generator. A remainder portion of the second set of locations of the reference sensors of the array of reference sensors is determined in response to (i) the first portion of the second set of locations determined using the second mechanism and (ii) the predefined known configuration of the array of reference sensors. The method further includes compensating for metal distortion of the electromagnetic field in the region of interest as a function of the first and second sets of reference sensor locations of the array of reference sensors.
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