Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11402258Application Date: 2006-04-12
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Publication No.: US07903232B2Publication Date: 2011-03-08
- Inventor: Martinus Hendrikus Antonius Leenders , Michel Riepen , Martin Anton Bos
- Applicant: Martinus Hendrikus Antonius Leenders , Michel Riepen , Martin Anton Bos
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/52
- IPC: G03B27/52 ; G03B27/42
Abstract:
An immersion lithographic exposure apparatus in which the pH of the top coat of the immersion liquid is chosen so as to maximize the relative speed at which a part of the liquid supply system and the substrate W can be moved relative to each other without collapse of a meniscus extending between those components.
Public/Granted literature
- US20070243697A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-10-18
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