Invention Grant
- Patent Title: Nitride semiconductor light-emitting device
- Patent Title (中): 氮化物半导体发光器件
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Application No.: US10554991Application Date: 2004-05-27
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Publication No.: US07903707B2Publication Date: 2011-03-08
- Inventor: Takeshi Kamikawa , Yoshika Kaneko , Kensaku Motoki
- Applicant: Takeshi Kamikawa , Yoshika Kaneko , Kensaku Motoki
- Applicant Address: JP Osaka JP Osaka
- Assignee: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- Current Assignee: Sharp Kabushiki Kaisha,Sumitomo Electric Industries, Ltd.
- Current Assignee Address: JP Osaka JP Osaka
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2003-153621 20030530
- International Application: PCT/JP2004/007681 WO 20040527
- International Announcement: WO2004/107516 WO 20041209
- Main IPC: H01S5/00
- IPC: H01S5/00

Abstract:
A nitride semiconductor light-emitting device wherein a substrate or nitride semiconductor layer has a defect concentration region and a low defect density region other than the defect concentration region. A portion including the defect concentration region of the nitride semiconductor layer or substrate has a trench region deeper than the low defect density region. Thus by digging the trench in the defect concentration region, the growth detection is uniformized, and the surface planarity is improved. The uniformity of the characteristic in the wafer surface leads to improvement of the yield.
Public/Granted literature
- US20070051961A1 Nitride semiconductor light-emitting device Public/Granted day:2007-03-08
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