Invention Grant
US07903877B2 Radical-based HMM modeling for handwritten East Asian characters
有权
用于手写东亚字符的基于激进的HMM建模
- Patent Title: Radical-based HMM modeling for handwritten East Asian characters
- Patent Title (中): 用于手写东亚字符的基于激进的HMM建模
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Application No.: US11682722Application Date: 2007-03-06
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Publication No.: US07903877B2Publication Date: 2011-03-08
- Inventor: Shi Han , Yu Zou , Ming Chang , Peng Liu , Yi-Jian Wu , Lei Ma , Frank Soong , Dongmei Zhang , Jian Wang
- Applicant: Shi Han , Yu Zou , Ming Chang , Peng Liu , Yi-Jian Wu , Lei Ma , Frank Soong , Dongmei Zhang , Jian Wang
- Applicant Address: US WA Redmond
- Assignee: Microsoft Corporation
- Current Assignee: Microsoft Corporation
- Current Assignee Address: US WA Redmond
- Agency: Lee & Hayes, PLLC
- Main IPC: G06K9/00
- IPC: G06K9/00 ; G06K9/18

Abstract:
Exemplary methods, systems, and computer-readable media for developing, training and/or using models for online handwriting recognition of characters are described. An exemplary method for building a trainable radical-based HMM for use in character recognition includes defining radical nodes, where a radical node represents a structural element of an character, and defining connection nodes, where a connection node represents a spatial relationship between two or more radicals. Such a method may include determining a number of paths in the radical-based HMM using subsequence direction histogram vector (SDHV) clustering and determining a number of states in the radical-based HMM using curvature scale space-based (CSS) corner detection.
Public/Granted literature
- US20080219556A1 Radical-Based HMM Modeling for Handwritten East Asian Characters Public/Granted day:2008-09-11
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