Invention Grant
US07906088B2 Method of removing impurities from gas or liquid streams using copper oxide and halide salt 有权
使用氧化铜和卤化物盐从气体或液体流中除去杂质的方法

  • Patent Title: Method of removing impurities from gas or liquid streams using copper oxide and halide salt
  • Patent Title (中): 使用氧化铜和卤化物盐从气体或液体流中除去杂质的方法
  • Application No.: US12548223
    Application Date: 2009-08-26
  • Publication No.: US07906088B2
    Publication Date: 2011-03-15
  • Inventor: Vladislav I. KanazirevPeter Rumfola, III
  • Applicant: Vladislav I. KanazirevPeter Rumfola, III
  • Applicant Address: US IL Des Plaines
  • Assignee: UOP LLC
  • Current Assignee: UOP LLC
  • Current Assignee Address: US IL Des Plaines
  • Agent Mark Goldberg
  • Main IPC: B01D53/00
  • IPC: B01D53/00
Method of removing impurities from gas or liquid streams using copper oxide and halide salt
Abstract:
Mixing small amounts of an inorganic halide, such as NaCl, to basic copper carbonate followed by calcination at a temperature sufficient to decompose the carbonate results in a significant improvement in resistance to reduction of the resulting copper oxide. The introduction of the halide can be also achieved during the precipitation of the carbonate precursor. These reduction resistant copper oxides can be in the form of composites with alumina and are especially useful for purification of gas or liquid streams containing hydrogen or other reducing agents. These reduction resistant copper oxides can function at near ambient temperatures.
Information query
Patent Agency Ranking
0/0