Invention Grant
US07906171B2 Method for production of a layer having nanoparticles, on a substrate
有权
在衬底上制备具有纳米颗粒的层的方法
- Patent Title: Method for production of a layer having nanoparticles, on a substrate
- Patent Title (中): 在衬底上制备具有纳米颗粒的层的方法
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Application No.: US11994845Application Date: 2006-07-03
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Publication No.: US07906171B2Publication Date: 2011-03-15
- Inventor: Rene Jabado , Ursus Krüger , Daniel Körtvelyessy , Volkmar Lüthen , Ralph Reiche , Michael Rindler
- Applicant: Rene Jabado , Ursus Krüger , Daniel Körtvelyessy , Volkmar Lüthen , Ralph Reiche , Michael Rindler
- Applicant Address: DE Munich
- Assignee: Siemens Aktiegesellschaft
- Current Assignee: Siemens Aktiegesellschaft
- Current Assignee Address: DE Munich
- Agency: Young & Thompson
- Priority: DE102005032711 20050707
- International Application: PCT/EP2006/063778 WO 20060703
- International Announcement: WO2007/006674 WO 20070118
- Main IPC: B05D1/12
- IPC: B05D1/12

Abstract:
The invention relates to a method for producing a layer (110) having nanoparticles (40), on a substrate (100). The invention is based on the object of specifying a method for producing a layer containing nanoparticles, which method can be carried out particularly easily and nevertheless offers a very wide degree of freedom for the configuration and the composition of the layer to be produced. According to the invention, this object is achieved in that nanoparticles (40) are released and a nanoparticle stream (50) is produced in a first process chamber (10), the nanoparticle stream (50) is passed into a second process chamber (80), and the nanoparticles (40) are deposited on the substrate (100) in the second process chamber (80).
Public/Granted literature
- US20090047444A1 METHOD FOR PRODUCTION OF A LAYER HAVING NANOPARTICLES, ON A SUBSTRATE Public/Granted day:2009-02-19
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