Invention Grant
- Patent Title: Oxygen-reducing catalyst layer
- Patent Title (中): 氧还原催化剂层
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Application No.: US11379523Application Date: 2006-04-20
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Publication No.: US07906251B2Publication Date: 2011-03-15
- Inventor: Dennis P. O'Brien , Alison K. Schmoeckel , George D. Vernstrom , Radoslav Atanasoski , Thomas E. Wood , Ruizhi Yang , E. Bradley Easton , Jeffrey R. Dahn , David G. O'Neill
- Applicant: Dennis P. O'Brien , Alison K. Schmoeckel , George D. Vernstrom , Radoslav Atanasoski , Thomas E. Wood , Ruizhi Yang , E. Bradley Easton , Jeffrey R. Dahn , David G. O'Neill
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Philip Y. Dahl; Stephen L. Crooks
- Main IPC: H01M4/02
- IPC: H01M4/02

Abstract:
An oxygen-reducing catalyst layer, and a method of making the oxygen-reducing catalyst layer, where the oxygen-reducing catalyst layer includes a catalytic material film disposed on a substrate with the use of physical vapor deposition and thermal treatment. The catalytic material film includes a transition metal that is substantially free of platinum. At least one of the physical vapor deposition and the thermal treatment is performed in a processing environment comprising a nitrogen-containing gas.
Public/Granted literature
- US20070248875A1 OXYGEN-REDUCING CATALYST LAYER Public/Granted day:2007-10-25
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