Invention Grant
US07906255B2 Photo-masks and methods of fabricating periodic optical structures 有权
光掩模和制造周期性光学结构的方法

Photo-masks and methods of fabricating periodic optical structures
Abstract:
Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.
Public/Granted literature
Information query
Patent Agency Ranking
0/0