Invention Grant
- Patent Title: Photo-masks and methods of fabricating periodic optical structures
- Patent Title (中): 光掩模和制造周期性光学结构的方法
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Application No.: US11970502Application Date: 2008-01-07
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Publication No.: US07906255B2Publication Date: 2011-03-15
- Inventor: Thomas K. Gaylord , Justin L. Stay , James D. Meindl
- Applicant: Thomas K. Gaylord , Justin L. Stay , James D. Meindl
- Applicant Address: US GA Atlanta
- Assignee: Georgia Tech Research Corporation
- Current Assignee: Georgia Tech Research Corporation
- Current Assignee Address: US GA Atlanta
- Agency: Troutman Sanders, LLP
- Agent Ryan A. Schneider, Esq.
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G02B5/18

Abstract:
Improved photo-masks for use in fabricating periodic structures are disclosed herein. Methods of making periodic structures, as well as the periodic structures fabricated therefrom, are also disclosed. The photo-mask can include a body element and one or more sets of diffractive elements and/or refractive elements disposed on the body element or within the body element. Each set of diffractive elements and/or refractive elements can be configured to produce four non-coplanar beams of light when a beam of light is passed through it. Each set of four non-coplanar beams of light can be used to interferometrically produce a specific periodic structure at a specific location within a photosensitive recording material.
Public/Granted literature
- US20080174754A1 PHOTO-MASKS AND METHODS OF FABRICATING PERIODIC OPTICAL STRUCTURES Public/Granted day:2008-07-24
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