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US07906353B2 Method of fabricating interferometric devices using lift-off processing techniques 有权
使用剥离处理技术制造干涉仪的方法

Method of fabricating interferometric devices using lift-off processing techniques
Abstract:
Embodiments of the present disclosure include a method of fabricating interferometric devices using lift-off processing techniques. Use of lift-off processing in the fabrication of various layers of interferometric modulators, such as an optical stack or a flex layer, advantageously avoids individualized chemistries associated with the plurality of materials associated with each layer thereof. Moreover, use of lift-off processing allows much greater selection in both materials and facilities available for fabrication of interferometric modulators.
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