Invention Grant
- Patent Title: Printing mask and solar cell
- Patent Title (中): 印刷面具和太阳能电池
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Application No.: US10591145Application Date: 2005-11-28
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Publication No.: US07906366B2Publication Date: 2011-03-15
- Inventor: Mitsunori Nakatani , Keizo Makino , Hisashi Tominaga
- Applicant: Mitsunori Nakatani , Keizo Makino , Hisashi Tominaga
- Applicant Address: JP Chiyoda-Ku, Tokyo
- Assignee: Mitsubishi Electric Corporation
- Current Assignee: Mitsubishi Electric Corporation
- Current Assignee Address: JP Chiyoda-Ku, Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- International Application: PCT/JP2005/021781 WO 20051128
- International Announcement: WO2007/060742 WO 20070531
- Main IPC: H01L31/18
- IPC: H01L31/18 ; H01L31/0224

Abstract:
A printing mask includes a mask frame and a mesh extended on the mask frame, in which a mask portion is formed by filling the mesh with resin to leave a pattern forming portion in a region corresponding to an electrode pattern to be formed on a printing object. The mask portion has a raised part on a surface of the mesh to be opposed to the printing object. The thickness of the raised part is such that a difference in average film thickness between the end and other parts of the electrode pattern formed with the printing mask is equal to or less than 5 micrometers.
Public/Granted literature
- US20080230118A1 Printing Mask and Solar Cell Public/Granted day:2008-09-25
Information query
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