Invention Grant
US07906394B1 Implanted vertical source-line under straight stack for FLASH EPROM 有权
嵌入垂直源线在FLASH EPROM的直堆栈下

Implanted vertical source-line under straight stack for FLASH EPROM
Abstract:
In FLASH EPROM cells, source diffusion continuity between horizontal and vertical source lines is provided by an arsenic implant under the stack in vertical source lines.
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