Invention Grant
US07906446B2 Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
有权
具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置
- Patent Title: Synthetic silica having low polarization-induced birefringence, method of making same and lithographic device comprising same
- Patent Title (中): 具有低偏振诱导双折射的合成二氧化硅，其制造方法和包含该双折射的平版印刷装置
-
Application No.: US12556848Application Date: 2009-09-10
-
Publication No.: US07906446B2Publication Date: 2011-03-15
- Inventor: Douglas Clippinger Allan , Dana Craig Bookbinder , Ulrich W H Neukirch , Charlene Marie Smith
- Applicant: Douglas Clippinger Allan , Dana Craig Bookbinder , Ulrich W H Neukirch , Charlene Marie Smith
- Applicant Address: US NY Corning
- Assignee: Corning Incorporated
- Current Assignee: Corning Incorporated
- Current Assignee Address: US NY Corning
- Agent Robert P. Santandrea; Siwen Chen
- Main IPC: C03C3/06
- IPC: C03C3/06
Abstract:
Disclosed are synthetic silica glass having a low polarization-induced birefringence, process for making the glass and lithography system comprising optical element made of the glass. The silica glass has a polarization-induced birefringence measured at 633 nm of less than about 0.1 nm/cm when subjected to excimer laser pulses at about 193 nm having a fluence of about 40 μJ·cm−2·pulse−1 and a pulse length of about 25 ns for 5×109 pulses.
Public/Granted literature
Information query
