Invention Grant
- Patent Title: Polyamic acid and polyimide
- Patent Title (中): 聚酰胺酸和聚酰亚胺
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Application No.: US12295705Application Date: 2007-02-28
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Publication No.: US07906611B2Publication Date: 2011-03-15
- Inventor: Hideo Suzuki , Takayuki Tamura , Kentaro Ohmori
- Applicant: Hideo Suzuki , Takayuki Tamura , Kentaro Ohmori
- Applicant Address: JP Tokyo
- Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee: Nissan Chemical Industries, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2006-102973 20060404
- International Application: PCT/JP2007/053720 WO 20070228
- International Announcement: WO2007/113954 WO 20071011
- Main IPC: C08G73/10
- IPC: C08G73/10

Abstract:
Disclosed are a polyamic acid containing not less than 10 mol % of a repeating unit represented by the formula [1] below, and a polyimide represented by the formula [2] below which is obtained from such a polyamic acid. The polyamic acid and polyimide have high heat resistance as shown by a thermal decomposition temperature of not less than 300° C. In addition, the polyamic acid and polyimide have good workability because of their high solubility in solvents, while exhibiting good light transmission. (In the formula, R1 and R2 independently represent a hydrogen atom or an alkyl group having 1 to 10 carbon atoms; R3 and R4 independently represent a hydrogen atom, a halogen atom, an alkyl group having 1 to 10 carbon atoms or a phenyl group, or alternatively R3 and R4 on adjacent carbon atoms may combine together to form a cycloalkyl group having 3 to 8 carbon atoms or a phenyl group; R5 represents a divalent organic group; and n represents an integer of not less than 2.)
Public/Granted literature
- US20090182115A1 POLYAMIC ACID AND POLYIMIDE Public/Granted day:2009-07-16
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