Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
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Application No.: US10924202Application Date: 2004-08-24
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Publication No.: US07907255B2Publication Date: 2011-03-15
- Inventor: Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- Applicant: Timotheus Franciscus Sengers , Marcus Adrianus Van De Kerkhof , Mark Kroon , Kees Van Weert
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Priority: EP03255395 20030829
- Main IPC: G03B27/72
- IPC: G03B27/72 ; G03B27/80 ; G03B27/42
Abstract:
A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector.
Public/Granted literature
- US20050078287A1 Lithographic apparatus and device manufacturing method Public/Granted day:2005-04-14
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