Invention Grant
- Patent Title: High-repetition laser system for generating ultra-short pulses according to the principle of cavity dumping
- Patent Title (中): 高重复激光系统根据腔体倾倒原理产生超短脉冲
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Application No.: US10581893Application Date: 2004-12-10
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Publication No.: US07907644B2Publication Date: 2011-03-15
- Inventor: Daniel Kopf , Maximilian Josef Lederer , Uwe Morgner
- Applicant: Daniel Kopf , Maximilian Josef Lederer , Uwe Morgner
- Applicant Address: AT Hohenems
- Assignee: High Q Laser Production GmbH
- Current Assignee: High Q Laser Production GmbH
- Current Assignee Address: AT Hohenems
- Agency: Oliff & Berridge, PLC
- International Application: PCT/EP2004/014078 WO 20041210
- International Announcement: WO2005/057741 WO 20050623
- Main IPC: H01S3/115
- IPC: H01S3/115 ; H01S3/098
Abstract:
A high-repetition laser system for generating ultra-short pulses according to the principle of pulse decoupling is described. This is achieved by the use of an amplifying laser medium, a laser resonator with at least one resonator mirror and at least one pulse decoupling component, a saturable absorber mirror, and a pump source for pumping the laser medium wherein the pulse decoupling component is an electro-optical modulator.
Public/Granted literature
- US07746908B2 High-repetition laser system for generating ultra-short pulses according to the principle of cavity dumping Public/Granted day:2010-06-29
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