Invention Grant
US07907771B2 Pattern data processing system, pattern data processing method, and pattern data processing program
有权
模式数据处理系统，模式数据处理方法和模式数据处理程序
- Patent Title: Pattern data processing system, pattern data processing method, and pattern data processing program
- Patent Title (中): 模式数据处理系统，模式数据处理方法和模式数据处理程序
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Application No.: US11848289Application Date: 2007-08-31
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Publication No.: US07907771B2Publication Date: 2011-03-15
- Inventor: Mitsuo Sakurai , Takahisa Itoh , Taketoshi Omata , Kenji Chichii
- Applicant: Mitsuo Sakurai , Takahisa Itoh , Taketoshi Omata , Kenji Chichii
- Applicant Address: JP Yokohama
- Assignee: Fujitsu Semiconductor Limited
- Current Assignee: Fujitsu Semiconductor Limited
- Current Assignee Address: JP Yokohama
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2006-247976 20060913
- Main IPC: G06K9/00
- IPC: G06K9/00
Abstract:
A pattern data processing method comprising, obtaining pattern data on a mask pattern, determining whether a processing time for the mask pattern in a processing software is reduced by rotating the mask pattern by a predetermined angle than a case where the mask pattern is processed in the processing software without being rotated, obtaining pattern data on a rotated pattern formed by rotating the mask pattern by the predetermined angle in the case that the processing time is reduced, processing the pattern data on the rotated pattern by using the processing software, and causing the mask pattern to return to its original direction.
Public/Granted literature
- US20080063259A1 PATTERN DATA PROCESSING SYSTEM, PATTERN DATA PROCESSING METHOD, AND PATTERN DATA PROCESSING PROGRAM Public/Granted day:2008-03-13
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