Invention Grant
- Patent Title: Elimination of stitch artifacts in a planar illumination area
- Patent Title (中): 在平面照明区域消除针迹伪影
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Application No.: US12324555Application Date: 2008-11-26
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Publication No.: US07907804B2Publication Date: 2011-03-15
- Inventor: Noam Meir , Micha Zimmermann , Yosi Shani
- Applicant: Noam Meir , Micha Zimmermann , Yosi Shani
- Applicant Address: IL Ramat Gan
- Assignee: Oree, Inc.
- Current Assignee: Oree, Inc.
- Current Assignee Address: IL Ramat Gan
- Agency: Bingham McCutchen LLP
- Main IPC: G02B6/26
- IPC: G02B6/26 ; G02F1/13357 ; F21V8/00 ; F21V7/04
Abstract:
In one aspect, a planar illumination area includes two light-guide elements, each with an out-coupling region. At least a portion of each out-coupling region overlaps with at least a portion of the other. The overlapping region emits a substantially uniform light output power.
Public/Granted literature
- US20090162015A1 STITCHES ELIMINATION STRUCTURE AND METHOD TO PROVIDE THE SAME Public/Granted day:2009-06-25
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