Invention Grant
- Patent Title: Dual-sided microstructured, position-sensitive detector
- Patent Title (中): 双面微结构,位置敏感检测器
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Application No.: US11639479Application Date: 2006-12-15
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Publication No.: US07915592B2Publication Date: 2011-03-29
- Inventor: Davor Protic , Thomas Krings , Ralf Schleichert
- Applicant: Davor Protic , Thomas Krings , Ralf Schleichert
- Applicant Address: DE Julich
- Assignee: Forschungszentrum Julich GmbH
- Current Assignee: Forschungszentrum Julich GmbH
- Current Assignee Address: DE Julich
- Agency: Ladas & Parry LLP
- Priority: DE10128654 20010615
- Main IPC: G01T1/24
- IPC: G01T1/24

Abstract:
The invention relates to a detector for determining the position and/or energy of photons and/or charged particles. Said detector comprises a plurality of diodes made of a semi-conductor material, n-contacts (1) and p-contacts (4), the n-contacts being provided by dividing an n-layer into individual segments. Said segments of the n-layer are 20-500 μm wide. Said detectors are produced by diffusing ions on the side of the semi-conductor material in order to produce an n-contact. A metallic layer is metallized thereon. Trenches are etched between the segments by means of lithography for the segmentation thereof. The inventive detector is high-powered and inter alia enables a high local resolution and high counting rates.
Public/Granted literature
- US20070152288A1 Dual-sided microstructured, position-sensitive detector Public/Granted day:2007-07-05
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