Invention Grant
- Patent Title: Semiconductor device and method of manufacturing the same
- Patent Title (中): 半导体装置及其制造方法
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Application No.: US11658228Application Date: 2005-07-07
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Publication No.: US07915709B2Publication Date: 2011-03-29
- Inventor: Godefridus Adrianus Maria Hurkx , Prabhat Agarwal , Abraham Rudolf Balkenende , Petrus Hubertus Cornelis Magnee , Melanie Maria Hubertina Wagemans , Erik Petrus Antonius Maria Bakkers , Erwin Hijzen
- Applicant: Godefridus Adrianus Maria Hurkx , Prabhat Agarwal , Abraham Rudolf Balkenende , Petrus Hubertus Cornelis Magnee , Melanie Maria Hubertina Wagemans , Erik Petrus Antonius Maria Bakkers , Erwin Hijzen
- Applicant Address: NL Eindhoven
- Assignee: NXP B.V.
- Current Assignee: NXP B.V.
- Current Assignee Address: NL Eindhoven
- Priority: EP04103458 20040720
- International Application: PCT/IB2005/052263 WO 20050707
- International Announcement: WO2006/011069 WO 20060202
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L21/8222

Abstract:
The invention relates to a semiconductor device (10) with a semiconductor body (12) comprising a bipolar transistor with an emitter region, a base region and a collector region (1, 2, 3) of, respectively, a first conductivity type, a second conductivity type opposite to the first conductivity type, and the first conductivity type. One of the emitter or collector regions (1, 3) comprises a nanowire (30). The base region (2) has been formed from a layer (20) at the surface of the semiconductor body (12); the other one (3, 1) of the emitter or collector regions (1, 3) has been formed in the semiconductor body (12) below the base region (2). The emitter or collector region (1, 3) comprising the nanowire (30) has been provided on the surface of the semiconductor body (12) such that its longitudinal axis extends perpendicularly to the surface.
Public/Granted literature
- US20090200641A1 Semiconductor device and method of manufacturing the same Public/Granted day:2009-08-13
Information query
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