Invention Grant
- Patent Title: Exposure apparatus, exposure method, and device manufacturing method
- Patent Title (中): 曝光装置，曝光方法和装置制造方法
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Application No.: US11712916Application Date: 2007-03-02
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Publication No.: US07916270B2Publication Date: 2011-03-29
- Inventor: Hiroyuki Nagasaka
- Applicant: Hiroyuki Nagasaka
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2006-057786 20060303
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/44 ; G03B27/54 ; G03B27/58
Abstract:
An exposure apparatus includes a projection optical system that has a first object field area and a second object field area different from the first object field area and that projects an image of a pattern onto a first image field and a second image field. The image of the pattern is formed in the first image field by exposure light via the first object field area, and the image of the pattern is formed in the second image field by exposure light via the second object field area. A first substrate is exposed with the image of the pattern formed in the first image field, and a second substrate is exposed with the image of the pattern formed in the second image field.
Public/Granted literature
- US20070242244A1 Exposure apparatus, exposure method, and device manufacturing method Public/Granted day:2007-10-18
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