Invention Grant
- Patent Title: Processing solution supply system, processing solution supply method and recording medium for storing processing solution supply control program
- Patent Title (中): 处理液供应系统,处理液供应方式和存储处理液供应控制程序的记录介质
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Application No.: US11798597Application Date: 2007-05-15
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Publication No.: US07918242B2Publication Date: 2011-04-05
- Inventor: Junya Minamida , Takahiro Okubo
- Applicant: Junya Minamida , Takahiro Okubo
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Smith, Gambrell & Russell, LLP
- Priority: JP2006-139910 20060519
- Main IPC: F04F1/10
- IPC: F04F1/10

Abstract:
A processing solution pressurized at a constant pressure is supplied to improve processing accuracy. A controller receives a pressure signal indicating a measured pressure exerted on a processing solution from a pressure sensor, and controls an electropneumatic regulator on the basis of the pressure signal so that pressure on the discharge side of the electropneumatic regulator is constant. The controller decides whether the processing solution contained in a processing solution tank has been depleted on the basis of a difference between a desired pressure and the pressure measured by the pressure sensor, and switches pressurizing shut-off valves accordingly.
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