Invention Grant
- Patent Title: Methods for placing substrates in contact with molten solder
- Patent Title (中): 使基板与熔融焊料接触的方法
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Application No.: US11140420Application Date: 2005-05-27
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Publication No.: US07918383B2Publication Date: 2011-04-05
- Inventor: Kyle K. Kirby , Salman Akram , Daniel P. Cram , Roy T. Lange , Warren M. Farnworth
- Applicant: Kyle K. Kirby , Salman Akram , Daniel P. Cram , Roy T. Lange , Warren M. Farnworth
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: TraskBritt
- Main IPC: B23K31/02
- IPC: B23K31/02

Abstract:
Methods and devices for placing a semiconductor wafer or other substrate in contact with solder are described. A wave soldering apparatus includes a solder bath, a nozzle for producing a solder wave, and a jig for orienting a substrate in a substantially vertical orientation and placing the substrate in contact with a cascading solder wave. In another wave soldering apparatus, a jig orients a semiconductor wafer in a substantially horizontal orientation in contact with the solder wave. Another soldering apparatus includes a tank comprising molten solder and a fixture configured to orient one or more semiconductor wafers in a substantially vertical orientation. Methods of placing semiconductor wafers or other substrates in contact with solder using the devices of the present invention are also disclosed.
Public/Granted literature
- US20060043154A1 Methods and apparatus for placing substrates in contact with molten solder Public/Granted day:2006-03-02
Information query
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