Invention Grant
US07918877B2 Lateral insertion method for spinous process spacer with deployable member
有权
具有可展开构件的棘突间隔物的横向插入方法
- Patent Title: Lateral insertion method for spinous process spacer with deployable member
- Patent Title (中): 具有可展开构件的棘突间隔物的横向插入方法
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Application No.: US11067835Application Date: 2005-02-28
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Publication No.: US07918877B2Publication Date: 2011-04-05
- Inventor: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant: James F. Zucherman , Ken Y. Hsu , Henry A. Klyce
- Applicant Address: CH Neuchatel
- Assignee: Kyphon SARL
- Current Assignee: Kyphon SARL
- Current Assignee Address: CH Neuchatel
- Agency: Coats and Bennett P.L.L.C.
- Main IPC: A61B17/88
- IPC: A61B17/88
Abstract:
A spine distraction implant alleviates pain associated with spinal stenosis and facet arthropathy by expanding the volume in the spine canal and/or neural foramen. The implant provides a deployable second arm that converts between a first position for insertion and a second position for retention of the implant between adjacent spinous processes. A tool can be used to insert the spine distraction implant.
Public/Granted literature
- US20050228383A1 Lateral insertion method for spinous process spacer with deployable member Public/Granted day:2005-10-13
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