Invention Grant
- Patent Title: Dispersion of high surface area silica
- Patent Title (中): 高表面积二氧化硅的分散
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Application No.: US12519000Application Date: 2007-08-28
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Publication No.: US07918933B2Publication Date: 2011-04-05
- Inventor: Wolfgang Lortz , Gabriele Perlet , Werner Will , Kai Schumacher
- Applicant: Wolfgang Lortz , Gabriele Perlet , Werner Will , Kai Schumacher
- Applicant Address: DE Essen
- Assignee: Evonik Degussa GmbH
- Current Assignee: Evonik Degussa GmbH
- Current Assignee Address: DE Essen
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: DE102006059316 20061215
- International Application: PCT/EP2007/058935 WO 20070828
- International Announcement: WO2008/071462 WO 20080619
- Main IPC: C01B33/14
- IPC: C01B33/14 ; C01B33/18 ; C01B33/113 ; C01B33/141

Abstract:
Dispersion comprising water and mixed potassium silicon oxide powder, where—the mixed oxide powder is in the form of aggregates of primary particles, has a BET surface area of 100 to 400 m2/g, has an average aggregate diameter in the dispersion of less than 100 nm, and possesses a potassium fraction of 0.05% to 1.5% by weight, calculated as K2O and based on the mixed oxide powder, and—the dispersion has a fraction of mixed oxide powder in the dispersion of 25% to 40% by weight, the sum of water and mixed oxide powder is at least 98% by weight and the pH is 9 to 11.5.
Public/Granted literature
- US20100107930A1 DISPERSION OF HIGH SURFACE AREA SILICA Public/Granted day:2010-05-06
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