Invention Grant
- Patent Title: High temperature ALD inlet manifold
- Patent Title (中): 高温ALD入口歧管
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Application No.: US11654372Application Date: 2007-01-17
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Publication No.: US07918938B2Publication Date: 2011-04-05
- Inventor: Timothy J. Provencher , Craig B. Hickson
- Applicant: Timothy J. Provencher , Craig B. Hickson
- Applicant Address: US AZ Phoenix
- Assignee: ASM America, Inc.
- Current Assignee: ASM America, Inc.
- Current Assignee Address: US AZ Phoenix
- Agency: Knobbe Martens Olson & Bear LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/455

Abstract:
A system and method for distributing one or more gases to an atomic layer deposition (ALD) reactor. An integrated inlet manifold block mounted over a showerhead assembly includes high temperature (up to 200° C.) rated valves mounted directly thereto, and short, easily purged reactant lines. Integral passageways and metal seals avoid o-rings and attendant dead zones along flow paths. The manifold includes an internal inert gas channel for purging reactant lines within the block inlet manifold
Public/Granted literature
- US20080202416A1 High temperature ALD inlet manifold Public/Granted day:2008-08-28
Information query
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