Invention Grant
- Patent Title: Apparatus for processing substrate
- Patent Title (中): 基板处理装置
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Application No.: US11342610Application Date: 2006-01-31
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Publication No.: US07918940B2Publication Date: 2011-04-05
- Inventor: Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
- Applicant: Ki-Choul An , Young-Chul Joung , Tae-Young Ha , Jung-Won Chang , Il-Ho Noh , Seung-Bae Lee
- Applicant Address: KR Chungcheongnam-do
- Assignee: Semes Co., Ltd.
- Current Assignee: Semes Co., Ltd.
- Current Assignee Address: KR Chungcheongnam-do
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: KR10-2005-0011334 20050207; KR10-2005-0018240 20050304; KR10-2005-0027022 20050331
- Main IPC: C23C16/00
- IPC: C23C16/00

Abstract:
In a substrate processing apparatus for forming thin layers on a substrate used for an organic light emitting diode, the apparatus includes a mask attaching chamber, a deposition chamber and a mask detaching chamber. The mask attaching chamber, the deposition chamber and the mask detaching chamber are provided with a transferring guide installed thereinside, and a substrate supporter for supporting the substrate moves along the transferring guide in or between the chambers. Thus, a time for processing the substrate and an area for the apparatus may be reduced. Also, the chambers are grouped in one or more, and a gate valve is installed between the grouped chambers for opening and closing a path between the grouped chambers. Accordingly, the chambers may be continuously maintained in a vacuum state when any one of the chambers is repaired.
Public/Granted literature
- US20060174829A1 Apparatus for processing substrate Public/Granted day:2006-08-10
Information query
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