Invention Grant
- Patent Title: Process for producing pressure-sensitive adhesive layer
- Patent Title (中): 压敏粘合剂层的制造方法
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Application No.: US12162736Application Date: 2008-01-31
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Publication No.: US07919140B2Publication Date: 2011-04-05
- Inventor: Kazuhisa Maeda , Isao Hirose , Kunio Nagasaki
- Applicant: Kazuhisa Maeda , Isao Hirose , Kunio Nagasaki
- Applicant Address: JP Osaka
- Assignee: Nitto Denko Corporation
- Current Assignee: Nitto Denko Corporation
- Current Assignee Address: JP Osaka
- Agency: Sughrue Mion, PLLC
- Priority: JPP.2007-025116 20070205
- International Application: PCT/JP2008/051505 WO 20080131
- International Announcement: WO2008/096661 WO 20080814
- Main IPC: C08J3/28
- IPC: C08J3/28 ; C08F2/46 ; C09D5/00 ; C09D5/20

Abstract:
The present invention relates to a process for producing a pressure-sensitive adhesive layer, which includes irradiating a photopolymerizable acrylic pressure-sensitive adhesive composition layer provided between two films with an active energy beam to polymerize the photopolymerizable acrylic pressure-sensitive adhesive composition layer, in which the polymerization is performed while a layer of a composition for preventing polymerization inhibition which is curable with an active energy beam in the atmosphere is provided on a side surface of the photopolymerizable acrylic pressure-sensitive adhesive composition layer. According to the process for producing a pressure-sensitive adhesive layer of the present invention, owing to the construction as discussed above, it is possible to reuse a film. Moreover, it is possible to prevent a lowering in the cohesive force in the side surface of the thus formed pressure-sensitive adhesive composition layer caused by a lowering in the polymerization degree in the side surface of the photopolymerizable acrylic pressure-sensitive adhesive composition layer during the photopolymerization.
Public/Granted literature
- US20090023832A1 PROCESS FOR PRODUCING PRESSURE-SENSITIVE ADHESIVE LAYER Public/Granted day:2009-01-22
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