Invention Grant
- Patent Title: Mask and design method thereof
- Patent Title (中): 其面膜及其设计方法
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Application No.: US12270566Application Date: 2008-11-13
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Publication No.: US07919216B2Publication Date: 2011-04-05
- Inventor: Chia-Wei Lin , Teng-Yen Huang
- Applicant: Chia-Wei Lin , Teng-Yen Huang
- Applicant Address: TW Tao-Yuan Hsien
- Assignee: Nanya Technology Corp.
- Current Assignee: Nanya Technology Corp.
- Current Assignee Address: TW Tao-Yuan Hsien
- Agency: Volpe and Koenig, P.C.
- Priority: TW97107207A 20080229
- Main IPC: G03F1/00
- IPC: G03F1/00
Abstract:
A mask and the design method thereof are provided. The mask includes a light-shielding area shielding off a light, wherein the light-shielding area includes a photonic crystal having a lattice constant, and a ratio of the lattice constant to a wavelength of the light is a specific value within a band gap of the photonic crystal.
Public/Granted literature
- US20090220868A1 MASK AND DESIGN METHOD THEREOF Public/Granted day:2009-09-03
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