Invention Grant
- Patent Title: Method for a multiple exposure beams lithography tool
- Patent Title (中): 多重曝光光栅光刻工具的方法
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Application No.: US11918576Application Date: 2005-04-19
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Publication No.: US07919218B2Publication Date: 2011-04-05
- Inventor: Fredrik Sjostrom
- Applicant: Fredrik Sjostrom
- Applicant Address: SE Taby
- Assignee: Micronic Laser Systems AB
- Current Assignee: Micronic Laser Systems AB
- Current Assignee Address: SE Taby
- Agency: Haynes Beffel & Wolfeld LLP
- Agent Ernest J. Beffel, Jr.
- International Application: PCT/SE2005/000560 WO 20050419
- International Announcement: WO2006/110073 WO 20061019
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
An aspect of the present invention includes a method for patterning a workpiece covered at least partly with a layer sensitive to electromagnetic radiation by simultaneously using a plurality of exposure beams. In an example embodiment it is determined if any of the beams have an actual position relative to a reference beam which differs from its intended position. An adjustment of the exposure dose for a wrongly positioned beam is performed if said beam is printed at en edge of a feature. Other aspects of the present invention are reflected in the detailed description, figures and claims.
Public/Granted literature
- US20090197188A1 Method for a multiple exposure beams lithography tool Public/Granted day:2009-08-06
Information query
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