Invention Grant
US07919226B2 Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
有权
磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
- Patent Title: Sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process
- Patent Title (中): 磺酸盐和衍生物，光酸产生剂，抗蚀剂组合物和图案化方法
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Application No.: US12222645Application Date: 2008-08-13
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Publication No.: US07919226B2Publication Date: 2011-04-05
- Inventor: Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
- Applicant: Youichi Ohsawa , Takeru Watanabe , Takeshi Kinsho , Katsuhiro Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2005-109903 20050406; JP2005-316096 20051031
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C07C309/06
Abstract:
Sulfonate salts have the formula:CF3—CH(OCOR)—CF2SO3−M+ wherein R is C1-C20 alkyl or C6-C14 aryl, and M+ is a lithium, sodium, potassium, ammonium or tetramethylammonium ion. Onium salts, oximesulfonates and sulfonyloxyimides and other compounds derived from these sulfonate salts are effective photoacid generators in chemically amplified resist compositions.
Public/Granted literature
- US20080318160A1 Novel sulfonate salts and derivatives, photoacid generators, resist compositions, and patterning process Public/Granted day:2008-12-25
Information query
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