Invention Grant
- Patent Title: Phosphor coating process for light emitting diode
- Patent Title (中): 发光二极管荧光粉涂层工艺
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Application No.: US11892002Application Date: 2007-08-17
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Publication No.: US07919229B2Publication Date: 2011-04-05
- Inventor: Tzu-Hao Chao , Yi-Tsuo Wu
- Applicant: Tzu-Hao Chao , Yi-Tsuo Wu
- Applicant Address: TW Tu Chen, Taipei Hsien
- Assignee: Everlight Electronics Co., Ltd.
- Current Assignee: Everlight Electronics Co., Ltd.
- Current Assignee Address: TW Tu Chen, Taipei Hsien
- Agency: Muncy, Geissler, Olds & Lowe, PLLC
- Priority: TW96112770A 20070411
- Main IPC: H01L33/00
- IPC: H01L33/00

Abstract:
A phosphor coating process for a light-emitting device is described. A light-emitting diode chip is bonded on a substrate. A light-sensitive layer is formed over the light-emitting diode and the substrate. The light-sensitive layer is patterned by a photolithography process to expose an area of the light-emitting diode chip, on which desires a phosphor coating. A phosphor-adhesive material is filled on the area of the light-emitting diode chip.
Public/Granted literature
- US20080254393A1 Phosphor coating process for light emitting diode Public/Granted day:2008-10-16
Information query
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